Assembled Dual Seal.
Optimal Solution for Controlling Contamination Defects in Semiconductor Wafers
Product Introduction
Assembled Dual Seal.
Assembled Dual Seal.
In the semiconductor industry, where no impurity can be tolerated, addressing contamination defects that occur after the CMP process is crucial for yield improvement. At the heart of this solution is the functional PURIENCE PVA Brush.
Product Brochure
AssembledDual Seal Features
High elasticity when wetted
Capability to manufacture various brush shapes
Adjustable pore size
Excellent mechanical properties and wear resistance
Strong resistance to sunlight and UV radiation
Heat resistance up to 80°C in wet conditions and 120°C in dry conditions
No dust generation
Absorbs 12–18 times its weight in moisture
Pores connected in an open-cell structure